{"product_id":"chemical-mechanical-polishing-2000-fundamentals-and-materials-issues-volume-613-cambridge-university-press-9781107413146-rajiv-k-singh","title":"Chemical-Mechanical Polishing 2000 – Fundamentals and Materials Issues: Volume 613","description":"\u003cp\u003eDiscover the essential technology behind semiconductor manufacturing with \u003cstrong\u003eChemical-Mechanical Polishing 2000 – Fundamentals and Materials Issues: Volume 613\u003c\/strong\u003e by \u003cstrong\u003eRajiv K. Singh\u003c\/strong\u003e. Published by \u003cstrong\u003eCambridge University Press\u003c\/strong\u003e in 2014, this comprehensive paperback spans \u003cstrong\u003e176 pages\u003c\/strong\u003e and delves into the critical role of chemical-mechanical polishing (CMP) in the planarization of multilevel metallization systems and shallow-trench isolation.\u003c\/p\u003e \n\n\u003cp\u003eThis insightful volume, originally published in 2001, showcases presentations from leading experts in academia, government institutions, and industry, providing a thorough understanding of the fundamental processes involved in CMP. Whether you are a professional in the field or a student eager to learn, this book offers invaluable knowledge and perspectives on electrolytic polishing, grinding, and polishing techniques.\u003c\/p\u003e \n\n\u003cp\u003eEnhance your expertise in semiconductor technology with this essential resource from Rajiv K. Singh, and stay ahead in the ever-evolving world of manufacturing.\u003c\/p\u003e","brand":"Rajiv K. Singh","offers":[{"title":"Default Title","offer_id":52250213286230,"sku":"9781107413146","price":32.74,"currency_code":"EUR","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0886\/3206\/6390\/files\/9781107413146.jpg?v=1767777153","url":"https:\/\/www.englishbook.pt\/products\/chemical-mechanical-polishing-2000-fundamentals-and-materials-issues-volume-613-cambridge-university-press-9781107413146-rajiv-k-singh","provider":"Bookshop","version":"1.0","type":"link"}