• Book cover of: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond. By: Guilei Wang

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Guilei Wang

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Autorius Guilei Wang
Leidimo metai 2019 m.
Puslapių skč. 115 psl.
Viršelis Kietas viršelis
ISBN 9789811500459
Leidimas 2019 ed.

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Book cover of: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond. By: Guilei Wang

Investigation on SiGe Selective Epita...

€109,12
€109,12 €112,49